EXPOSURE REQUEST FORM
Please forward one week before exposure request, to
Craig Stevens (Tel. 225-578-4603), located at
CAMD/LSU,
6980 Jefferson Highway, 70806, Room
106. The samples should accompany the routing
sh
eet or be deposited at the facility, in the “User Box”.
Project Reference Number (PRN): ___________________________________
Contact Person: _______________________ Phone: _______________ E-mail: ______________
SAMPLE DESCRIPTION AND EXPOSURE PARAMETERS
Sample Name: ___________________________
Resist Type: ___________________________ Resist Thickness: ___________________ (µm)
Substrate Material: ______________________ Size: _____________________________ (cm)
Mask Name: ____________________________ Mask Format: __________________________
Mask Membrane Material and Thickness: __________________________________________ (µm)
Thickness of SU-8 Layer remaining on the mask: ____________________________________ (µm)
Ring Energy: _____________________ (Gev) Beamline: _____________________________
Filter Material and Thickness: ____________________ (µm) He Pressure: _____________ (torr)
Proximity Gap: __________ (µm)
Min. Bottom Dose: _____________ (J/cm3) Max. Ratio of Top to Bottom Dose: _________
Scan Length: ______________ (cm or inch) Aperture required: ___________________ (cm)
Dose per cm: ______________ (mA.min/cm) Total Dose: _____________________ (mA.min)
Cooling required:
□ mask & substrate □ mask only □ no cooling
Exposure will be performed by user
□ Yes □ No
CAMD OFFICE USE ONLY
Date received at CAMD: ___________________ Approved by: __________________________
Anticipated exposure date at CAMD: ___________________________________________________
Exposure performed at CAMD by: _____________ at ___________ Beamline on Date: __________
Date notified to pick up: ______________ Date picked up: ___________ by: __________________
Form Revised: 01/200
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